Bouchoule, Andre <br/><br/>
Dusty plasmas  phycs, chemistry and technological impacts in plasma processing 

 - Chichester  John Wiley  1999 
 - vii,408 p.  Illustration 
<br/><br/><label>ISBN: </label>0471973866 
<br/><br/><label>Subjects--Topical Terms: </label><br/>PLASMA PHYSICS<br/>PLASMA PHYSICS<br/>PLASMA PHYSICS<br/>VAPOR DEPOSITION
<br/><br/><label>Universal Decimal Class. No.: </label>66.088  / DUS